Negative-tone development

{
  "id": "MLC-T-CHM-007808",
  "term": "Negative-tone development",
  "field": "Chemistry",
  "definition": "A lithographic process where the exposed regions of a photoresist become insoluble and remain on the substrate after development, while the unexposed regions are dissolved. This results in a negative replica of the mask pattern. Negative-tone resists are often cross-linking polymers that become less soluble upon irradiation.",
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1882 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/negative-tone-development/"
}