Deprotection
Term · Chemistry · MLC-T-CHM-003034
The chemical removal of a protecting group from a functional group within a molecule. This process restores the original reactivity of the functional group, which had been temporarily masked to prevent unwanted reactions during synthesis. In photolithography, deprotection is often triggered by exposure to light or heat, altering the solubility of a polymer resist.
| Identifier | MLC-T-CHM-003034 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1870 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Resist |
Record as JSON
{
"id": "MLC-T-CHM-003034",
"term": "Deprotection",
"field": "Chemistry",
"definition": "The chemical removal of a protecting group from a functional group within a molecule. This process restores the original reactivity of the functional group, which had been temporarily masked to prevent unwanted reactions during synthesis. In photolithography, deprotection is often triggered by exposure to light or heat, altering the solubility of a polymer resist.",
"subject": "Polymer",
"see_also": [
"resist"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1870 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/deprotection/"
}
Record 3,228 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.