Base quencher

{
  "id": "MLC-T-CHM-001124",
  "term": "Base quencher",
  "field": "Chemistry",
  "definition": "A basic compound added to a chemically amplified resist formulation to control the diffusion and reaction of the photogenerated acid. By neutralizing excess acid, the quencher limits the extent of the catalytic deprotection reaction, thereby improving resolution and controlling the size of the patterned features. The concentration of the base quencher is a parameter used to fine-tune the sensitivity and contrast of the resist.",
  "subject": "Polymer",
  "see_also": [
    "chemically amplified resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1868 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/base-quencher/"
}