Direct-write lithography

{
  "id": "MLC-T-CHM-003273",
  "term": "Direct-write lithography",
  "field": "Chemistry",
  "definition": "A lithographic process that creates patterns directly on a substrate without the use of a physical mask. This technique employs a focused beam, such as an electron beam or laser, to expose a resist material point by point or line by line. It offers flexibility in pattern design and is suitable for prototyping or low-volume production.",
  "subject": "Polymer",
  "see_also": [
    "electron beam lithography",
    "image",
    "mask"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1876 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/direct-write-lithography/"
}