2-photon lithography
Term · Chemistry · MLC-T-CHM-000014
A high-resolution additive manufacturing technique that uses a focused femtosecond laser to induce a two-photon absorption process in a photoresist. This localized absorption initiates polymerization only at the focal point, allowing for the creation of complex three-dimensional micro- and nanostructures. The technique achieves resolutions below the diffraction limit of light, typically in the range of 100 to 200 nanometers.
| Identifier | MLC-T-CHM-000014 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| Synonyms | two-photon lithography |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Photolithography |
Record as JSON
{
"id": "MLC-T-CHM-000014",
"term": "2-photon lithography",
"field": "Chemistry",
"definition": "A high-resolution additive manufacturing technique that uses a focused femtosecond laser to induce a two-photon absorption process in a photoresist. This localized absorption initiates polymerization only at the focal point, allowing for the creation of complex three-dimensional micro- and nanostructures. The technique achieves resolutions below the diffraction limit of light, typically in the range of 100 to 200 nanometers.",
"synonyms": [
"two-photon lithography"
],
"subject": "Polymer",
"see_also": [
"photolithography"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/2-photon-lithography/"
}
Record 14 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.