Plasma enhanced chemical vapor deposition

{
  "id": "MLC-T-CHM-009009",
  "term": "Plasma enhanced chemical vapor deposition",
  "field": "Chemistry",
  "definition": "A chemical vapor deposition (CVD) process that uses plasma to energize reactant gases, allowing deposition to occur at lower temperatures than conventional CVD. The plasma generates highly reactive species that facilitate chemical reactions on the substrate surface, forming a thin film. This technique is widely used in semiconductor manufacturing for depositing dielectric and conductive layers.",
  "subject": "Polymer",
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1884 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/plasma-enhanced-chemical-vapor-deposition/"
}