Sputtering rate

{
  "id": "MLC-T-CHM-011256",
  "term": "Sputtering rate",
  "field": "Chemistry",
  "definition": "The quantity of sample material, given as an amount, a mass or a number of particles, that is removed by particle bombardment in one unit of time, with SI units such as mol/s, kg/s or 1/s. It depends on the primary ion current density, the sputtering yield and the ion energy. In depth profiling it is often converted to a sputtered depth per unit time, such as nm/min, using reference films of known thickness.",
  "subject": "Analytical Chemistry",
  "see_also": [
    "erosion rate"
  ],
  "references": [
    "PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1814 (https://doi.org/10.1515/pac-2019-0404)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/sputtering-rate/"
}