Partial sputtering yield
Term · Chemistry · MLC-T-CHM-008497
The number of atoms or molecules of a specific species ejected from a solid surface per incident particle during a sputtering process. This quantity is dependent on the incident particle's energy and angle, as well as the target material's composition and binding energy. It is a measure of the efficiency of removing a particular component from the surface.
| Identifier | MLC-T-CHM-008497 |
|---|---|
| Field | Chemistry |
| Subject | Analytical Chemistry |
| References | PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1809 (https://doi.org/10.1515/pac-2019-0404) |
| See also | Fractional ion yield; Fractional sputtering yield; Negative-ion yield; Positive-ion yield; Total ion yield |
Record as JSON
{
"id": "MLC-T-CHM-008497",
"term": "Partial sputtering yield",
"field": "Chemistry",
"definition": "The number of atoms or molecules of a specific species ejected from a solid surface per incident particle during a sputtering process. This quantity is dependent on the incident particle's energy and angle, as well as the target material's composition and binding energy. It is a measure of the efficiency of removing a particular component from the surface.",
"subject": "Analytical Chemistry",
"see_also": [
"fractional ion yield",
"fractional sputtering yield",
"negative-ion yield",
"positive-ion yield",
"total ion yield"
],
"references": [
"PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1809 (https://doi.org/10.1515/pac-2019-0404)"
],
"url": "https://mlchart.com/terminology/chemistry/partial-sputtering-yield/"
}
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