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Partial sputtering yield

Term · Chemistry · MLC-T-CHM-008497

The number of atoms or molecules of a specific species ejected from a solid surface per incident particle during a sputtering process. This quantity is dependent on the incident particle's energy and angle, as well as the target material's composition and binding energy. It is a measure of the efficiency of removing a particular component from the surface.

Table 1. Record
IdentifierMLC-T-CHM-008497
FieldChemistry
SubjectAnalytical Chemistry
ReferencesPAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1809 (https://doi.org/10.1515/pac-2019-0404)
See alsoFractional ion yield; Fractional sputtering yield; Negative-ion yield; Positive-ion yield; Total ion yield
Record as JSON
{
  "id": "MLC-T-CHM-008497",
  "term": "Partial sputtering yield",
  "field": "Chemistry",
  "definition": "The number of atoms or molecules of a specific species ejected from a solid surface per incident particle during a sputtering process. This quantity is dependent on the incident particle's energy and angle, as well as the target material's composition and binding energy. It is a measure of the efficiency of removing a particular component from the surface.",
  "subject": "Analytical Chemistry",
  "see_also": [
    "fractional ion yield",
    "fractional sputtering yield",
    "negative-ion yield",
    "positive-ion yield",
    "total ion yield"
  ],
  "references": [
    "PAC, 2020, 92, 1781. 'Glossary of methods and terms used in surface chemical analysis (IUPAC Recommendations 2020)' on page 1809 (https://doi.org/10.1515/pac-2019-0404)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/partial-sputtering-yield/"
}

Record 9,025 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.