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Sputter yield

Term · Chemistry · MLC-T-CHM-011254

The average number of atoms or molecules ejected from a solid surface per incident energetic particle, typically an ion. This dimensionless quantity depends on the incident ion's energy, mass, and angle of incidence, as well as the target material's properties. It is a fundamental parameter in understanding sputtering processes in surface science and thin film deposition.

Table 1. Record
IdentifierMLC-T-CHM-011254
FieldChemistry
SubjectAnalytical Chemistry
ReferencesPAC, 1979, 51, 2243. 'General aspects of trace analytical methods - IV. Recommendations for nomenclature, standard procedures and reporting of experimental data for surface analysis techniques' on page 2247 (https://doi.org/10.1351/pac197951112243)
Record as JSON
{
  "id": "MLC-T-CHM-011254",
  "term": "Sputter yield",
  "field": "Chemistry",
  "definition": "The average number of atoms or molecules ejected from a solid surface per incident energetic particle, typically an ion. This dimensionless quantity depends on the incident ion's energy, mass, and angle of incidence, as well as the target material's properties. It is a fundamental parameter in understanding sputtering processes in surface science and thin film deposition.",
  "subject": "Analytical Chemistry",
  "references": [
    "PAC, 1979, 51, 2243. 'General aspects of trace analytical methods - IV. Recommendations for nomenclature, standard procedures and reporting of experimental data for surface analysis techniques' on page 2247 (https://doi.org/10.1351/pac197951112243)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/sputter-yield/"
}

Record 11,993 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.