Post-exposure delay

{
  "id": "MLC-T-CHM-009306",
  "term": "Post-exposure delay",
  "field": "Chemistry",
  "definition": "The time interval between the end of the exposure of a resist film to radiation and the start of the subsequent processing step, such as baking or development. This delay allows for diffusion and reaction processes to occur within the resist material. The duration of this delay can significantly influence the final pattern resolution and resist sensitivity.",
  "subject": "Polymer",
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1885 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/post-exposure-delay/"
}