MLchartDataset catalogue

Anneal

Term · Semiconductors · MLC-T-SEM-000023

A high-temperature thermal treatment applied to semiconductor wafers to modify their electrical or structural properties. This process can activate dopants, repair crystal lattice damage caused by ion implantation, or relieve stress in deposited films. Annealing temperatures typically range from a few hundred to over a thousand degrees Celsius.

Table 1. Record
IdentifierMLC-T-SEM-000023
FieldSemiconductors
SubjectFront-End Process
Record as JSON 
{
  "id": "MLC-T-SEM-000023",
  "term": "Anneal",
  "field": "Semiconductors",
  "definition": "A high-temperature thermal treatment applied to semiconductor wafers to modify their electrical or structural properties. This process can activate dopants, repair crystal lattice damage caused by ion implantation, or relieve stress in deposited films. Annealing temperatures typically range from a few hundred to over a thousand degrees Celsius.",
  "subject": "Front-End Process",
  "url": "https://mlchart.com/terminology/semiconductors/anneal/"
}

Record 15 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.