MLchartDataset catalogue

Furnace

Term · Semiconductors · MLC-T-SEM-000144

A piece of equipment used in semiconductor manufacturing to perform high-temperature thermal processes on wafers, such as annealing, oxidation, and diffusion. Wafers are loaded into a quartz tube within a heated chamber, allowing for precise temperature control and uniform processing. Furnaces can process multiple wafers simultaneously in a batch.

Table 1. Record
IdentifierMLC-T-SEM-000144
FieldSemiconductors
SubjectFront-End Process
Record as JSON 
{
  "id": "MLC-T-SEM-000144",
  "term": "Furnace",
  "field": "Semiconductors",
  "definition": "A piece of equipment used in semiconductor manufacturing to perform high-temperature thermal processes on wafers, such as annealing, oxidation, and diffusion. Wafers are loaded into a quartz tube within a heated chamber, allowing for precise temperature control and uniform processing. Furnaces can process multiple wafers simultaneously in a batch.",
  "subject": "Front-End Process",
  "url": "https://mlchart.com/terminology/semiconductors/furnace/"
}

Record 143 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.