MLchartDataset catalogue

Thermal oxidation

Term · Semiconductors · MLC-T-SEM-000333

A semiconductor manufacturing process where a layer of silicon dioxide is grown on the surface of a silicon wafer by exposing it to an oxidizing ambient at high temperatures. This oxide layer serves as an insulator, a mask for doping, or a gate dielectric. The process can be dry oxidation (using oxygen) or wet oxidation (using water vapor).

Table 1. Record
IdentifierMLC-T-SEM-000333
FieldSemiconductors
SubjectFront-End Process
Record as JSON 
{
  "id": "MLC-T-SEM-000333",
  "term": "Thermal oxidation",
  "field": "Semiconductors",
  "definition": "A semiconductor manufacturing process where a layer of silicon dioxide is grown on the surface of a silicon wafer by exposing it to an oxidizing ambient at high temperatures. This oxide layer serves as an insulator, a mask for doping, or a gate dielectric. The process can be dry oxidation (using oxygen) or wet oxidation (using water vapor).",
  "subject": "Front-End Process",
  "url": "https://mlchart.com/terminology/semiconductors/thermal-oxidation/"
}

Record 349 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.