MLchartDataset catalogue

Etch

Term · Semiconductors · MLC-T-SEM-000121

The selective removal of material from a substrate, such as a silicon wafer, to create circuit patterns. This process follows lithography, where a patterned photoresist layer protects certain areas while exposing others to the etching agent. Etching is performed using either wet chemical methods with liquid etchants or dry plasma methods, which provide greater directional control for creating high-aspect-ratio features.

Table 1. Record
IdentifierMLC-T-SEM-000121
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000121",
  "term": "Etch",
  "field": "Semiconductors",
  "definition": "The selective removal of material from a substrate, such as a silicon wafer, to create circuit patterns. This process follows lithography, where a patterned photoresist layer protects certain areas while exposing others to the etching agent. Etching is performed using either wet chemical methods with liquid etchants or dry plasma methods, which provide greater directional control for creating high-aspect-ratio features.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/etch/"
}

Record 118 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.