MLchartDataset catalogue

Spin-on

Term · Semiconductors · MLC-T-SEM-000316

A deposition technique where a liquid material, such as photoresist or a dielectric precursor, is dispensed onto the center of a spinning wafer. Centrifugal force spreads the liquid uniformly across the wafer surface, and excess material is spun off. The thickness of the resulting film is controlled by the viscosity of the liquid and the spin speed.

Table 1. Record
IdentifierMLC-T-SEM-000316
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000316",
  "term": "Spin-on",
  "field": "Semiconductors",
  "definition": "A deposition technique where a liquid material, such as photoresist or a dielectric precursor, is dispensed onto the center of a spinning wafer. Centrifugal force spreads the liquid uniformly across the wafer surface, and excess material is spun off. The thickness of the resulting film is controlled by the viscosity of the liquid and the spin speed.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/spin-on/"
}

Record 330 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.