MLchartDataset catalogue

Marangoni drying

Term · Semiconductors · MLC-T-SEM-000210

A wafer drying technique that prevents watermarks by creating a surface tension gradient across the wafer. An alcohol vapor, such as isopropyl alcohol, is introduced into the drying chamber, which lowers the surface tension of the water at the liquid-vapor interface. This gradient drives the liquid film off the wafer surface, leaving it spotless.

Table 1. Record
IdentifierMLC-T-SEM-000210
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000210",
  "term": "Marangoni drying",
  "field": "Semiconductors",
  "definition": "A wafer drying technique that prevents watermarks by creating a surface tension gradient across the wafer. An alcohol vapor, such as isopropyl alcohol, is introduced into the drying chamber, which lowers the surface tension of the water at the liquid-vapor interface. This gradient drives the liquid film off the wafer surface, leaving it spotless.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/marangoni-drying/"
}

Record 215 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.