MLchartDataset catalogue

Chamber clean

Term · Semiconductors · MLC-T-SEM-000053

A process performed periodically to remove residual materials and byproducts that accumulate on the internal surfaces of a processing chamber during semiconductor manufacturing. This cleaning prevents contamination and maintains the integrity of subsequent wafer processing steps. Common cleaning methods involve plasma etching using fluorine or chlorine-based gases.

Table 1. Record
IdentifierMLC-T-SEM-000053
FieldSemiconductors
SubjectEquipment & Automation
Record as JSON 
{
  "id": "MLC-T-SEM-000053",
  "term": "Chamber clean",
  "field": "Semiconductors",
  "definition": "A process performed periodically to remove residual materials and byproducts that accumulate on the internal surfaces of a processing chamber during semiconductor manufacturing. This cleaning prevents contamination and maintains the integrity of subsequent wafer processing steps. Common cleaning methods involve plasma etching using fluorine or chlorine-based gases.",
  "subject": "Equipment & Automation",
  "url": "https://mlchart.com/terminology/semiconductors/chamber-clean/"
}

Record 45 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.