MLchartDataset catalogue

Ashing

Term · Semiconductors · MLC-T-SEM-000027

A dry etching process used in semiconductor manufacturing to remove photoresist residues after pattern transfer, typically employing an oxygen plasma. The oxygen plasma reacts with the organic photoresist material, converting it into volatile gaseous byproducts that are then pumped away. This process is also known as plasma ashing or photoresist stripping.

Table 1. Record
IdentifierMLC-T-SEM-000027
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000027",
  "term": "Ashing",
  "field": "Semiconductors",
  "definition": "A dry etching process used in semiconductor manufacturing to remove photoresist residues after pattern transfer, typically employing an oxygen plasma. The oxygen plasma reacts with the organic photoresist material, converting it into volatile gaseous byproducts that are then pumped away. This process is also known as plasma ashing or photoresist stripping.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/ashing/"
}

Record 19 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.