MLchartDataset catalogue

Negative resist

Term · Semiconductors · MLC-T-SEM-000227

A type of photoresist material that becomes insoluble in the developer solution after exposure to radiation. When exposed, the polymer chains in the resist cross-link, forming a hardened, insoluble material. After development, the unexposed areas are washed away, leaving behind a negative replica of the mask pattern.

Table 1. Record
IdentifierMLC-T-SEM-000227
FieldSemiconductors
SubjectLithography & Patterning
Record as JSON 
{
  "id": "MLC-T-SEM-000227",
  "term": "Negative resist",
  "field": "Semiconductors",
  "definition": "A type of photoresist material that becomes insoluble in the developer solution after exposure to radiation. When exposed, the polymer chains in the resist cross-link, forming a hardened, insoluble material. After development, the unexposed areas are washed away, leaving behind a negative replica of the mask pattern.",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/negative-resist/"
}

Record 232 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.