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Native oxide

Term · Semiconductors · MLC-T-SEM-000225

A thin layer of oxide that spontaneously forms on the surface of a semiconductor material when exposed to an oxygen-containing environment, such as air. This self-passivating layer grows rapidly at first and then slows as it isolates the underlying material from further reaction. For silicon exposed to ambient air, the native oxide is primarily silicon dioxide (SiO2) and reaches a self-limiting thickness of approximately 1 to 2 nanometers.

Table 1. Record
IdentifierMLC-T-SEM-000225
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000225",
  "term": "Native oxide",
  "field": "Semiconductors",
  "definition": "A thin layer of oxide that spontaneously forms on the surface of a semiconductor material when exposed to an oxygen-containing environment, such as air. This self-passivating layer grows rapidly at first and then slows as it isolates the underlying material from further reaction. For silicon exposed to ambient air, the native oxide is primarily silicon dioxide (SiO2) and reaches a self-limiting thickness of approximately 1 to 2 nanometers.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/native-oxide/"
}

Record 231 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.