MLchartDataset catalogue

HF dip

Term · Semiconductors · MLC-T-SEM-000158

A cleaning step involving immersion of a silicon wafer in a dilute hydrofluoric acid solution. This process is primarily used to remove native silicon dioxide or other oxide layers from the wafer surface. The concentration of HF and the immersion time are carefully controlled to achieve the desired oxide removal without damaging the underlying silicon.

Table 1. Record
IdentifierMLC-T-SEM-000158
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000158",
  "term": "HF dip",
  "field": "Semiconductors",
  "definition": "A cleaning step involving immersion of a silicon wafer in a dilute hydrofluoric acid solution. This process is primarily used to remove native silicon dioxide or other oxide layers from the wafer surface. The concentration of HF and the immersion time are carefully controlled to achieve the desired oxide removal without damaging the underlying silicon.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/hf-dip/"
}

Record 159 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.