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Piranha

Term · Semiconductors · MLC-T-SEM-000250

A highly aggressive cleaning solution consisting of a mixture of concentrated sulfuric acid and hydrogen peroxide. This solution is used to remove organic residues and photoresist from semiconductor wafers through strong oxidation. Due to its extreme reactivity, piranha solution must be handled with strict safety precautions.

Table 1. Record
IdentifierMLC-T-SEM-000250
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000250",
  "term": "Piranha",
  "field": "Semiconductors",
  "definition": "A highly aggressive cleaning solution consisting of a mixture of concentrated sulfuric acid and hydrogen peroxide. This solution is used to remove organic residues and photoresist from semiconductor wafers through strong oxidation. Due to its extreme reactivity, piranha solution must be handled with strict safety precautions.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/piranha/"
}

Record 259 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.