MLchartDataset catalogue

Extreme ultraviolet lithography

Term · Semiconductors · MLC-T-SEM-000124

An advanced photolithography technique that uses light with an extremely short wavelength, typically 13.5 nanometers, to print features on semiconductor wafers. EUV lithography enables the fabrication of integrated circuits with critical dimensions below 10 nanometers, pushing the limits of Moore's Law. This technology requires a vacuum environment and reflective optics due to the strong absorption of EUV light by most materials.

Table 1. Record
IdentifierMLC-T-SEM-000124
FieldSemiconductors
SubjectLithography & Patterning
AbbreviationEUV
Record as JSON 
{
  "id": "MLC-T-SEM-000124",
  "term": "Extreme ultraviolet lithography",
  "field": "Semiconductors",
  "definition": "An advanced photolithography technique that uses light with an extremely short wavelength, typically 13.5 nanometers, to print features on semiconductor wafers. EUV lithography enables the fabrication of integrated circuits with critical dimensions below 10 nanometers, pushing the limits of Moore's Law. This technology requires a vacuum environment and reflective optics due to the strong absorption of EUV light by most materials.",
  "abbreviation": "EUV",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/extreme-ultraviolet-lithography/"
}

Record 122 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.