MLchartDataset catalogue

Numerical aperture

Term · Semiconductors · MLC-T-SEM-000233

A dimensionless quantity, abbreviated NA, that indicates the range of angles from which a lens system can accept or emit light. In photolithography, a higher NA allows the projection lens to capture more diffraction orders, which enables the printing of smaller feature sizes. The resolution of a projection system is directly proportional to the wavelength of light and inversely proportional to its numerical aperture.

Table 1. Record
IdentifierMLC-T-SEM-000233
FieldSemiconductors
SubjectLithography & Patterning
AbbreviationNA
Record as JSON 
{
  "id": "MLC-T-SEM-000233",
  "term": "Numerical aperture",
  "field": "Semiconductors",
  "definition": "A dimensionless quantity, abbreviated NA, that indicates the range of angles from which a lens system can accept or emit light. In photolithography, a higher NA allows the projection lens to capture more diffraction orders, which enables the printing of smaller feature sizes. The resolution of a projection system is directly proportional to the wavelength of light and inversely proportional to its numerical aperture.",
  "abbreviation": "NA",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/numerical-aperture/"
}

Record 239 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.