MLchartDataset catalogue

Optical proximity correction

Term · Semiconductors · MLC-T-SEM-000234

A computational lithography technique that intentionally modifies photomask patterns to compensate for image distortions caused by diffraction and process effects. These pre-distortions, such as serifs or hammerheads, are added to the mask layout so the final printed feature on the wafer more accurately matches the original design intent. Optical proximity correction (OPC) is a standard procedure for manufacturing nodes below 250 nanometers.

Table 1. Record
IdentifierMLC-T-SEM-000234
FieldSemiconductors
SubjectLithography & Patterning
AbbreviationOPC
Record as JSON 
{
  "id": "MLC-T-SEM-000234",
  "term": "Optical proximity correction",
  "field": "Semiconductors",
  "definition": "A computational lithography technique that intentionally modifies photomask patterns to compensate for image distortions caused by diffraction and process effects. These pre-distortions, such as serifs or hammerheads, are added to the mask layout so the final printed feature on the wafer more accurately matches the original design intent. Optical proximity correction (OPC) is a standard procedure for manufacturing nodes below 250 nanometers.",
  "abbreviation": "OPC",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/optical-proximity-correction/"
}

Record 240 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.