MLchartDataset catalogue

Phase shift mask

Term · Semiconductors · MLC-T-SEM-000245

A photolithography mask that alters the phase of light passing through it to enhance image contrast and resolution during semiconductor manufacturing. This technique creates sharper patterns on the wafer by exploiting destructive interference between light waves. Phase shift masks are particularly effective for printing features below the optical diffraction limit of conventional masks.

Table 1. Record
IdentifierMLC-T-SEM-000245
FieldSemiconductors
SubjectLithography & Patterning
AbbreviationPSM
Record as JSON 
{
  "id": "MLC-T-SEM-000245",
  "term": "Phase shift mask",
  "field": "Semiconductors",
  "definition": "A photolithography mask that alters the phase of light passing through it to enhance image contrast and resolution during semiconductor manufacturing. This technique creates sharper patterns on the wafer by exploiting destructive interference between light waves. Phase shift masks are particularly effective for printing features below the optical diffraction limit of conventional masks.",
  "abbreviation": "PSM",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/phase-shift-mask/"
}

Record 254 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.