MLchartDataset catalogue

Deep ultraviolet

Term · Semiconductors · MLC-T-SEM-000084

A range of ultraviolet light with wavelengths typically between 193 nanometers and 248 nanometers, used as the illumination source in advanced photolithography systems. The shorter wavelength of DUV light enables the printing of finer features and smaller critical dimensions on semiconductor wafers. Excimer lasers, such as KrF (248 nm) and ArF (193 nm), are common DUV sources.

Table 1. Record
IdentifierMLC-T-SEM-000084
FieldSemiconductors
SubjectLithography & Patterning
AbbreviationDUV
Record as JSON 
{
  "id": "MLC-T-SEM-000084",
  "term": "Deep ultraviolet",
  "field": "Semiconductors",
  "definition": "A range of ultraviolet light with wavelengths typically between 193 nanometers and 248 nanometers, used as the illumination source in advanced photolithography systems. The shorter wavelength of DUV light enables the printing of finer features and smaller critical dimensions on semiconductor wafers. Excimer lasers, such as KrF (248 nm) and ArF (193 nm), are common DUV sources.",
  "abbreviation": "DUV",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/deep-ultraviolet/"
}

Record 79 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.