MLchartDataset catalogue

Multi-patterning

Term · Semiconductors · MLC-T-SEM-000221

A set of lithography techniques used to create features smaller than what a single exposure step can resolve. This involves splitting a complex design into multiple simpler patterns, which are then exposed and processed sequentially on the wafer. Common multi-patterning approaches include double patterning (LELE, SADP) and triple or quadruple patterning, extending the capabilities of existing lithography tools.

Table 1. Record
IdentifierMLC-T-SEM-000221
FieldSemiconductors
SubjectLithography & Patterning
Record as JSON 
{
  "id": "MLC-T-SEM-000221",
  "term": "Multi-patterning",
  "field": "Semiconductors",
  "definition": "A set of lithography techniques used to create features smaller than what a single exposure step can resolve. This involves splitting a complex design into multiple simpler patterns, which are then exposed and processed sequentially on the wafer. Common multi-patterning approaches include double patterning (LELE, SADP) and triple or quadruple patterning, extending the capabilities of existing lithography tools.",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/multi-patterning/"
}

Record 227 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.