MLchartDataset catalogue

Immersion lithography

Term · Semiconductors · MLC-T-SEM-000168

A photolithography technique that places a liquid medium, typically deionized water, between the projection lens and the photoresist-coated wafer during exposure. This liquid has a refractive index greater than air, effectively increasing the numerical aperture of the lens and allowing for the printing of finer features. Immersion lithography extended the capabilities of DUV systems to achieve resolutions below 45 nanometers.

Table 1. Record
IdentifierMLC-T-SEM-000168
FieldSemiconductors
SubjectLithography & Patterning
Record as JSON 
{
  "id": "MLC-T-SEM-000168",
  "term": "Immersion lithography",
  "field": "Semiconductors",
  "definition": "A photolithography technique that places a liquid medium, typically deionized water, between the projection lens and the photoresist-coated wafer during exposure. This liquid has a refractive index greater than air, effectively increasing the numerical aperture of the lens and allowing for the printing of finer features. Immersion lithography extended the capabilities of DUV systems to achieve resolutions below 45 nanometers.",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/immersion-lithography/"
}

Record 169 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.