MLchartDataset catalogue

Depth of focus

Term · Semiconductors · MLC-T-SEM-000089

The range of vertical distance over which a lithography system can maintain acceptable image quality and resolution on a semiconductor wafer. A larger depth of focus allows for greater tolerance to variations in wafer topography and flatness during exposure. This parameter is inversely related to the numerical aperture and directly related to the wavelength of the exposure light.

Table 1. Record
IdentifierMLC-T-SEM-000089
FieldSemiconductors
SubjectLithography & Patterning
AbbreviationDoF
Record as JSON
{
  "id": "MLC-T-SEM-000089",
  "term": "Depth of focus",
  "field": "Semiconductors",
  "definition": "The range of vertical distance over which a lithography system can maintain acceptable image quality and resolution on a semiconductor wafer. A larger depth of focus allows for greater tolerance to variations in wafer topography and flatness during exposure. This parameter is inversely related to the numerical aperture and directly related to the wavelength of the exposure light.",
  "abbreviation": "DoF",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/depth-of-focus/"
}

Record 84 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.