Depth of focus
Term · Semiconductors · MLC-T-SEM-000089
The range of vertical distance over which a lithography system can maintain acceptable image quality and resolution on a semiconductor wafer. A larger depth of focus allows for greater tolerance to variations in wafer topography and flatness during exposure. This parameter is inversely related to the numerical aperture and directly related to the wavelength of the exposure light.
| Identifier | MLC-T-SEM-000089 |
|---|---|
| Field | Semiconductors |
| Subject | Lithography & Patterning |
| Abbreviation | DoF |
Record as JSON
{
"id": "MLC-T-SEM-000089",
"term": "Depth of focus",
"field": "Semiconductors",
"definition": "The range of vertical distance over which a lithography system can maintain acceptable image quality and resolution on a semiconductor wafer. A larger depth of focus allows for greater tolerance to variations in wafer topography and flatness during exposure. This parameter is inversely related to the numerical aperture and directly related to the wavelength of the exposure light.",
"abbreviation": "DoF",
"subject": "Lithography & Patterning",
"url": "https://mlchart.com/terminology/semiconductors/depth-of-focus/"
}
Record 84 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.