MLchartDataset catalogue

Profilometry

Term · Semiconductors · MLC-T-SEM-000271

A metrology technique used to measure the surface topography and roughness of semiconductor wafers and thin films. It involves scanning a probe or light beam across the surface to create a detailed three-dimensional profile. Profilometry can quantify step heights, trench depths, and surface texture, with vertical resolution often in the nanometer range.

Table 1. Record
IdentifierMLC-T-SEM-000271
FieldSemiconductors
SubjectMetrology, Inspection & Yield
Record as JSON 
{
  "id": "MLC-T-SEM-000271",
  "term": "Profilometry",
  "field": "Semiconductors",
  "definition": "A metrology technique used to measure the surface topography and roughness of semiconductor wafers and thin films. It involves scanning a probe or light beam across the surface to create a detailed three-dimensional profile. Profilometry can quantify step heights, trench depths, and surface texture, with vertical resolution often in the nanometer range.",
  "subject": "Metrology, Inspection & Yield",
  "url": "https://mlchart.com/terminology/semiconductors/profilometry/"
}

Record 280 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.