MLchartDataset catalogue

Ellipsometry

Term · Semiconductors · MLC-T-SEM-000111

A non-destructive optical technique used to measure the thickness and optical properties of thin films on semiconductor wafers. It analyzes the change in polarization state of light reflected from a sample surface. Ellipsometry is widely used to characterize dielectric layers, photoresists, and other thin films with thicknesses ranging from angstroms to micrometers.

Table 1. Record
IdentifierMLC-T-SEM-000111
FieldSemiconductors
SubjectMetrology, Inspection & Yield
Record as JSON 
{
  "id": "MLC-T-SEM-000111",
  "term": "Ellipsometry",
  "field": "Semiconductors",
  "definition": "A non-destructive optical technique used to measure the thickness and optical properties of thin films on semiconductor wafers. It analyzes the change in polarization state of light reflected from a sample surface. Ellipsometry is widely used to characterize dielectric layers, photoresists, and other thin films with thicknesses ranging from angstroms to micrometers.",
  "subject": "Metrology, Inspection & Yield",
  "url": "https://mlchart.com/terminology/semiconductors/ellipsometry/"
}

Record 108 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.