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Chemical vapour deposition

Term · Semiconductors · MLC-T-SEM-000057

A process used to deposit thin films of solid materials onto a substrate from a gaseous phase. Precursor gases react or decompose on the heated substrate surface, forming a solid film and gaseous byproducts. This technique is widely employed in semiconductor manufacturing to create dielectric, conductive, and semiconducting layers.

Table 1. Record
IdentifierMLC-T-SEM-000057
FieldSemiconductors
SubjectDeposition, Etch & Clean
AbbreviationCVD
Record as JSON 
{
  "id": "MLC-T-SEM-000057",
  "term": "Chemical vapour deposition",
  "field": "Semiconductors",
  "definition": "A process used to deposit thin films of solid materials onto a substrate from a gaseous phase. Precursor gases react or decompose on the heated substrate surface, forming a solid film and gaseous byproducts. This technique is widely employed in semiconductor manufacturing to create dielectric, conductive, and semiconducting layers.",
  "abbreviation": "CVD",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/chemical-vapour-deposition/"
}

Record 49 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.