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Focused ion beam

Term · Semiconductors · MLC-T-SEM-000138

A technology that uses a finely focused beam of ions, typically gallium, to mill, deposit, or image materials at the nanoscale. Focused ion beam (FIB) systems are employed in semiconductor manufacturing for circuit editing, cross-sectional analysis, and defect localization. The ion beam can remove material with nanometer precision or deposit conductive or insulating films.

Table 1. Record
IdentifierMLC-T-SEM-000138
FieldSemiconductors
SubjectMetrology, Inspection & Yield
AbbreviationFIB
Record as JSON
{
  "id": "MLC-T-SEM-000138",
  "term": "Focused ion beam",
  "field": "Semiconductors",
  "definition": "A technology that uses a finely focused beam of ions, typically gallium, to mill, deposit, or image materials at the nanoscale. Focused ion beam (FIB) systems are employed in semiconductor manufacturing for circuit editing, cross-sectional analysis, and defect localization. The ion beam can remove material with nanometer precision or deposit conductive or insulating films.",
  "abbreviation": "FIB",
  "subject": "Metrology, Inspection & Yield",
  "url": "https://mlchart.com/terminology/semiconductors/focused-ion-beam/"
}

Record 137 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.