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E-beam lithography

Term · Semiconductors · MLC-T-SEM-000103

A patterning technique that uses a focused beam of electrons to create custom patterns on a resist-coated substrate. The electron beam directly writes the desired design by exposing the resist, which is then developed to form the pattern. This method offers extremely high resolution, capable of creating features down to a few nanometers, making it suitable for research and mask fabrication.

Table 1. Record
IdentifierMLC-T-SEM-000103
FieldSemiconductors
SubjectLithography & Patterning
Record as JSON 
{
  "id": "MLC-T-SEM-000103",
  "term": "E-beam lithography",
  "field": "Semiconductors",
  "definition": "A patterning technique that uses a focused beam of electrons to create custom patterns on a resist-coated substrate. The electron beam directly writes the desired design by exposing the resist, which is then developed to form the pattern. This method offers extremely high resolution, capable of creating features down to a few nanometers, making it suitable for research and mask fabrication.",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/e-beam-lithography/"
}

Record 100 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.