Immersion lithography
Term · Chemistry · MLC-T-CHM-005619
A photolithographic technique that enhances resolution by filling the space between the projection lens and the wafer with a high refractive index liquid, rather than air. This allows for the use of a higher numerical aperture, effectively increasing the resolution limit of the optical system. It is a key technology for manufacturing advanced semiconductor devices with smaller feature sizes.
| Identifier | MLC-T-CHM-005619 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1877 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Photolithography; Immersion fluid; Resist |
Record as JSON
{
"id": "MLC-T-CHM-005619",
"term": "Immersion lithography",
"field": "Chemistry",
"definition": "A photolithographic technique that enhances resolution by filling the space between the projection lens and the wafer with a high refractive index liquid, rather than air. This allows for the use of a higher numerical aperture, effectively increasing the resolution limit of the optical system. It is a key technology for manufacturing advanced semiconductor devices with smaller feature sizes.",
"subject": "Polymer",
"see_also": [
"photolithography",
"immersion fluid",
"resist"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1877 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/immersion-lithography/"
}
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