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Hydrofluoric acid

Term · Semiconductors · MLC-T-SEM-000166

A highly corrosive and toxic acid, chemical formula HF, widely used in semiconductor manufacturing for etching silicon dioxide and silicon nitride layers. It is particularly effective for removing native oxides from silicon wafers. Due to its extreme hazards, including severe burns and systemic toxicity, its handling requires specialized personal protective equipment and strict safety protocols.

Table 1. Record
IdentifierMLC-T-SEM-000166
FieldSemiconductors
SubjectCleanroom, Contamination & EHS
AbbreviationHF
Record as JSON 
{
  "id": "MLC-T-SEM-000166",
  "term": "Hydrofluoric acid",
  "field": "Semiconductors",
  "definition": "A highly corrosive and toxic acid, chemical formula HF, widely used in semiconductor manufacturing for etching silicon dioxide and silicon nitride layers. It is particularly effective for removing native oxides from silicon wafers. Due to its extreme hazards, including severe burns and systemic toxicity, its handling requires specialized personal protective equipment and strict safety protocols.",
  "abbreviation": "HF",
  "subject": "Cleanroom, Contamination & EHS",
  "url": "https://mlchart.com/terminology/semiconductors/hydrofluoric-acid/"
}

Record 167 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.