MLchartDataset catalogue

Positive resist

Term · Semiconductors · MLC-T-SEM-000257

A type of photoresist whose exposed regions become soluble in the developer, so the unexposed regions remain as the pattern after development. The remaining resist therefore follows the opaque features of the photomask, while the openings in the resist correspond to its clear areas. Positive-tone chemically amplified resists dominate advanced DUV and EUV lithography, whereas diazonaphthoquinone-novolac resists serve in i-line lithography.

Table 1. Record
IdentifierMLC-T-SEM-000257
FieldSemiconductors
SubjectLithography & Patterning
Record as JSON 
{
  "id": "MLC-T-SEM-000257",
  "term": "Positive resist",
  "field": "Semiconductors",
  "definition": "A type of photoresist whose exposed regions become soluble in the developer, so the unexposed regions remain as the pattern after development. The remaining resist therefore follows the opaque features of the photomask, while the openings in the resist correspond to its clear areas. Positive-tone chemically amplified resists dominate advanced DUV and EUV lithography, whereas diazonaphthoquinone-novolac resists serve in i-line lithography.",
  "subject": "Lithography & Patterning",
  "url": "https://mlchart.com/terminology/semiconductors/positive-resist/"
}

Record 266 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.