MLchartDataset catalogue

Step coverage

Term · Semiconductors · MLC-T-SEM-000321

A measure of how well a deposited thin film conforms to the underlying topography of a substrate, particularly over steps and inside trenches or vias. It is quantified as the ratio of the film thickness on the sidewall of a feature to the film thickness on the top horizontal surface. A value of 100% represents perfectly conformal coverage, where the film thickness is uniform everywhere.

Table 1. Record
IdentifierMLC-T-SEM-000321
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000321",
  "term": "Step coverage",
  "field": "Semiconductors",
  "definition": "A measure of how well a deposited thin film conforms to the underlying topography of a substrate, particularly over steps and inside trenches or vias. It is quantified as the ratio of the film thickness on the sidewall of a feature to the film thickness on the top horizontal surface. A value of 100% represents perfectly conformal coverage, where the film thickness is uniform everywhere.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/step-coverage/"
}

Record 336 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.