MLchartDataset catalogue

Selectivity

Term · Semiconductors · MLC-T-SEM-000301

The ratio of the etch rate of a target material to the etch rate of another material, such as a masking layer or an underlying film. A high selectivity means the etching process removes the desired material much faster than it removes the mask or substrate. This ratio is a dimensionless quantity calculated by dividing the two respective etch rates, which are measured in units like nanometers per minute.

Table 1. Record
IdentifierMLC-T-SEM-000301
FieldSemiconductors
SubjectDeposition, Etch & Clean
Record as JSON 
{
  "id": "MLC-T-SEM-000301",
  "term": "Selectivity",
  "field": "Semiconductors",
  "definition": "The ratio of the etch rate of a target material to the etch rate of another material, such as a masking layer or an underlying film. A high selectivity means the etching process removes the desired material much faster than it removes the mask or substrate. This ratio is a dimensionless quantity calculated by dividing the two respective etch rates, which are measured in units like nanometers per minute.",
  "subject": "Deposition, Etch & Clean",
  "url": "https://mlchart.com/terminology/semiconductors/selectivity/"
}

Record 312 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.