MLchartDataset catalogue

Ultrapure water

Term · Semiconductors · MLC-T-SEM-000342

Water purified to a very low level of ionic, organic, particulate, and microbial contamination, used in a fab for rinsing wafers and mixing chemicals. It is made by multi-stage treatment including reverse osmosis, ion exchange, degassing, and ultraviolet oxidation, then polished and circulated in a loop. Its resistivity sits at the theoretical limit for pure water, 18.18 megaohm-centimeters at 25 °C, usually quoted as 18.2.

Table 1. Record
IdentifierMLC-T-SEM-000342
FieldSemiconductors
SubjectFacilities, Vacuum & Chemicals
AbbreviationUPW
Record as JSON 
{
  "id": "MLC-T-SEM-000342",
  "term": "Ultrapure water",
  "field": "Semiconductors",
  "definition": "Water purified to a very low level of ionic, organic, particulate, and microbial contamination, used in a fab for rinsing wafers and mixing chemicals. It is made by multi-stage treatment including reverse osmosis, ion exchange, degassing, and ultraviolet oxidation, then polished and circulated in a loop. Its resistivity sits at the theoretical limit for pure water, 18.18 megaohm-centimeters at 25 °C, usually quoted as 18.2.",
  "abbreviation": "UPW",
  "subject": "Facilities, Vacuum & Chemicals",
  "url": "https://mlchart.com/terminology/semiconductors/ultrapure-water/"
}

Record 361 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.