MLchartDataset catalogue

Barrier layer

Term · Semiconductors · MLC-T-SEM-000038

A thin film deposited in semiconductor devices to prevent the diffusion of atoms between adjacent material layers. For example, a barrier layer of tantalum or titanium nitride is used to prevent copper from diffusing into silicon or dielectric materials. This layer maintains device integrity and prevents electrical shorts or performance degradation.

Table 1. Record
IdentifierMLC-T-SEM-000038
FieldSemiconductors
SubjectFront-End Process
Record as JSON 
{
  "id": "MLC-T-SEM-000038",
  "term": "Barrier layer",
  "field": "Semiconductors",
  "definition": "A thin film deposited in semiconductor devices to prevent the diffusion of atoms between adjacent material layers. For example, a barrier layer of tantalum or titanium nitride is used to prevent copper from diffusing into silicon or dielectric materials. This layer maintains device integrity and prevents electrical shorts or performance degradation.",
  "subject": "Front-End Process",
  "url": "https://mlchart.com/terminology/semiconductors/barrier-layer/"
}

Record 30 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.