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Low-k dielectric

Term · Semiconductors · MLC-T-SEM-000206

An insulating material used between interconnect layers in integrated circuits that possesses a dielectric constant (k) lower than that of silicon dioxide. These materials reduce parasitic capacitance between adjacent metal lines, which in turn minimizes signal delay and power consumption. Common low-k materials include porous silicon dioxide and carbon-doped oxides, with k values typically below 3.0.

Table 1. Record
IdentifierMLC-T-SEM-000206
FieldSemiconductors
SubjectFront-End Process
Record as JSON 
{
  "id": "MLC-T-SEM-000206",
  "term": "Low-k dielectric",
  "field": "Semiconductors",
  "definition": "An insulating material used between interconnect layers in integrated circuits that possesses a dielectric constant (k) lower than that of silicon dioxide. These materials reduce parasitic capacitance between adjacent metal lines, which in turn minimizes signal delay and power consumption. Common low-k materials include porous silicon dioxide and carbon-doped oxides, with k values typically below 3.0.",
  "subject": "Front-End Process",
  "url": "https://mlchart.com/terminology/semiconductors/low-k-dielectric/"
}

Record 211 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.