MLchartDataset catalogue

Silicide

Term · Semiconductors · MLC-T-SEM-000309

A compound formed by the reaction of a metal with silicon, typically used in semiconductor devices to reduce the contact resistance between metal interconnects and silicon regions. These materials exhibit low resistivity and good thermal stability, making them suitable for source, drain, and gate contacts. Common silicides include titanium silicide, cobalt silicide, and nickel silicide.

Table 1. Record
IdentifierMLC-T-SEM-000309
FieldSemiconductors
SubjectFront-End Process
Record as JSON 
{
  "id": "MLC-T-SEM-000309",
  "term": "Silicide",
  "field": "Semiconductors",
  "definition": "A compound formed by the reaction of a metal with silicon, typically used in semiconductor devices to reduce the contact resistance between metal interconnects and silicon regions. These materials exhibit low resistivity and good thermal stability, making them suitable for source, drain, and gate contacts. Common silicides include titanium silicide, cobalt silicide, and nickel silicide.",
  "subject": "Front-End Process",
  "url": "https://mlchart.com/terminology/semiconductors/silicide/"
}

Record 322 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.