MLchartDataset catalogue

Run to run control

Term · Semiconductors · MLC-T-SEM-000289

An automated process control method used in semiconductor manufacturing to adjust process parameters between consecutive wafer lots or runs. Based on metrology data from a completed run, the run to run control (R2R) system calculates and applies corrections to the recipe for the next run to compensate for process drift. This technique is applied to processes like chemical mechanical planarization (CMP) and plasma etching to maintain tight control over film thickness and feature dimensions.

Table 1. Record
IdentifierMLC-T-SEM-000289
FieldSemiconductors
SubjectSmart Manufacturing & AI
AbbreviationR2R
Record as JSON 
{
  "id": "MLC-T-SEM-000289",
  "term": "Run to run control",
  "field": "Semiconductors",
  "definition": "An automated process control method used in semiconductor manufacturing to adjust process parameters between consecutive wafer lots or runs. Based on metrology data from a completed run, the run to run control (R2R) system calculates and applies corrections to the recipe for the next run to compensate for process drift. This technique is applied to processes like chemical mechanical planarization (CMP) and plasma etching to maintain tight control over film thickness and feature dimensions.",
  "abbreviation": "R2R",
  "subject": "Smart Manufacturing & AI",
  "url": "https://mlchart.com/terminology/semiconductors/run-to-run-control/"
}

Record 299 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.