Normalized image log slope

{
  "id": "MLC-T-CHM-008077",
  "term": "Normalized image log slope",
  "field": "Chemistry",
  "definition": "A figure of merit for the aerial image in photolithography, defined as the feature width multiplied by the logarithmic slope of light intensity, (1/I)(dI/dx), at the nominal line edge. A higher value means a steeper intensity change at the edge, which gives a sharper printed line and a wider exposure latitude. It describes the optical image, whereas resist contrast is a separate property taken from a thickness versus dose curve.",
  "synonyms": [
    "normalized image slope"
  ],
  "subject": "Polymer",
  "see_also": [
    "aerial image"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1882 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/normalized-image-log-slope/"
}