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Dopant

Term · Semiconductors · MLC-T-SEM-000099

An impurity element intentionally introduced into a pure semiconductor material, such as silicon or germanium, to change its electrical properties. The process of adding a dopant is called doping, and it creates either n-type material by adding donor atoms or p-type material by adding acceptor atoms. Common dopants for silicon include boron to create p-type regions and phosphorus or arsenic to create n-type regions.

Table 1. Record
IdentifierMLC-T-SEM-000099
FieldSemiconductors
SubjectMaterials & Wafers
Record as JSON 
{
  "id": "MLC-T-SEM-000099",
  "term": "Dopant",
  "field": "Semiconductors",
  "definition": "An impurity element intentionally introduced into a pure semiconductor material, such as silicon or germanium, to change its electrical properties. The process of adding a dopant is called doping, and it creates either n-type material by adding donor atoms or p-type material by adding acceptor atoms. Common dopants for silicon include boron to create p-type regions and phosphorus or arsenic to create n-type regions.",
  "subject": "Materials & Wafers",
  "url": "https://mlchart.com/terminology/semiconductors/dopant/"
}

Record 96 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.