MLchartDataset catalogue

Purge

Term · Semiconductors · MLC-T-SEM-000273

To displace an unwanted gas from a process chamber, vacuum system, or gas delivery line by flowing an inert gas, such as nitrogen or argon, through it. This action removes residual reactive gases, moisture, or air before introducing process chemicals or after a process is complete. A purge cycle often involves repeatedly pressurizing the volume with inert gas and evacuating it to a vacuum pump to dilute contaminants to an acceptable level.

Table 1. Record
IdentifierMLC-T-SEM-000273
FieldSemiconductors
SubjectFacilities, Vacuum & Chemicals
Record as JSON
{
  "id": "MLC-T-SEM-000273",
  "term": "Purge",
  "field": "Semiconductors",
  "definition": "To displace an unwanted gas from a process chamber, vacuum system, or gas delivery line by flowing an inert gas, such as nitrogen or argon, through it. This action removes residual reactive gases, moisture, or air before introducing process chemicals or after a process is complete. A purge cycle often involves repeatedly pressurizing the volume with inert gas and evacuating it to a vacuum pump to dilute contaminants to an acceptable level.",
  "subject": "Facilities, Vacuum & Chemicals",
  "url": "https://mlchart.com/terminology/semiconductors/purge/"
}

Record 282 of 390 in Semiconductors terminology (MLC-0108). Request the full dataset.