Basting solvent

{
  "id": "MLC-T-CHM-001137",
  "term": "Basting solvent",
  "field": "Chemistry",
  "definition": "The solvent in which a photoresist, or another thin-film component such as a bottom anti-reflective coating, is dissolved so that it can be applied to a wafer by spin coating. It evaporates during the bake that follows and leaves the dry film behind. The choice of solvent also decides whether a new layer dissolves into the layer beneath it.",
  "subject": "Polymer",
  "see_also": [
    "bottom anti-reflective coating",
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1868 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/basting-solvent/"
}