Bottom anti-reflective coating
Term · Chemistry · MLC-T-CHM-001446
A layer of material applied beneath a photoresist in photolithography to absorb light that passes through the resist, preventing reflections from the substrate. These reflections can cause standing wave effects and reduce the resolution and fidelity of the patterned features. The coating typically consists of a polymer matrix with absorbing chromophores.
| Identifier | MLC-T-CHM-001446 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1868 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Line edge roughness |
Record as JSON
{
"id": "MLC-T-CHM-001446",
"term": "Bottom anti-reflective coating",
"field": "Chemistry",
"definition": "A layer of material applied beneath a photoresist in photolithography to absorb light that passes through the resist, preventing reflections from the substrate. These reflections can cause standing wave effects and reduce the resolution and fidelity of the patterned features. The coating typically consists of a polymer matrix with absorbing chromophores.",
"subject": "Polymer",
"see_also": [
"line edge roughness"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1868 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/bottom-anti-reflective-coating/"
}
Record 1,548 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.